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FilmTek 4000EM-DUV
FilmTek 4000
FilmTek 2000SE
FilmTek 3000 / 3000M
FilmTek 2000 / 2000M
FilmTek 1000 / 1500
Integrated Metrology
FilmTek CD

Metrology Products

FilmTek™ spectrophotometry-based metrology systems from Scientific Computing International (SCI) have long set the standards for characterization of thin films.  Now — our FilmTek™ 4000 Series "raises the bar" by delivering 100 times the resolution of the best non-contact method, and 10 times the resolution of the best prism coupler contact systems.  It's the result of our patented DPSD™ (Differential Power Spectral Density) technique.  And it's the latest example of how SCI is leading the thin film metrology field by raising  performance to a new level — while offering systems that are truly affordable for virtually every application.

Widest Film Thickness, Layer & Spectral Ranges

FilmTek™ metrology systems come in a variety of configurations, and depending on the model can measure reflection, reflection and transmission, multiple angle reflection, spectroscopic ellipsometry, and polarimetry data.  FilmTek™ systems provide peak performance from very-thin to very-thick films (up to 250 microns).  It's achieved by high wavelength resolution detectors combined with low cone angle optical design and apertures to limit measurement spot size.  Depending on the films involved, FilmTek™ systems can characterize up to fifteen layers.  And they all offer a wavelength measurement range from 190 to 1700 nm using our proprietary dispersion model.

Easy-to-Use Computer Power

Our complete, turn-key systems are designed for simple, efficient, trouble-free push-button operation.  The powerful software was designed to put measurements and answers just a click away.  And to help characterize and control deposition processes, it includes such capabilities as 2D and 3D contour and surface graphic plotting, a customizable database interface, and the ability to be controlled by a host computer.  Versatile, flexible, reliable standard and custom FilmTek™ systems are available in a variety of configurations — from manual table top models, to fully automated systems with robotic cassette transfer and pattern recognition.  All are designed for optimum accuracy and repeatability.  They're easy to calibrate and operate.  And, with features like our unique optical design with no moving parts, they deliver long-lasting, reliable, trouble-free performance.

 Affordable Systems for Virtually Every Budget

 A variety of configurations are offered in the standard FilmTek™ family.  SCI also develops customized models to meet special needs.  And they're all priced to fit most budgets.

•  FilmTek™ 1000 is the most affordable system for measuring reflection at normal incidence in the visible to NIR.

•  FilmTek™ 1500 adds transmission mode measurements to reflection.

•  FilmTek™ 2000 augments those capabilities to encompass surface roughness and reflection at normal incidence from deep UV to NIR. 

•  FilmTek™ 2000M-DUV has a small measurement spot size (5 µm) and measures optical properties from 190-1700 nm.

•  FilmTek™ 3000 / 3000M measures transmission and reflection of films deposited on transparent substrates. It's ideally suited for measuring the thickness and optical constants of very thin absorbing films.  The FilmTek™ 3000M has a small spot size (40 µm) and can be equipped with a large custom stage for flat panel display applications.

•  FilmTek™ 2000SE is an affordable spectroscopic ellipsometer that measures from the deep UV to NIR.  Based on a rotating compensator design, the FilmTek™ 2000SE spectroscopic ellipsometer combines spectroscopic ellipsometry with normal incidence reflectometry to make it ideally suited for measuring the thickness and optical constants of very thin films.

•  FilmTek™ 4000 is our most advanced model for thick-film applications.  It incorporates multiple detectors positioned at different angles of incidence — plus our patented multi-angle Differential Power Spectral Density analysis capability — to accurately measure the index of refraction with a resolution of 0.00002.  That's 100 times the performance of the best non-contact method, 10 times that of the best prism coupler contact systems.  The FilmTek™ 4000 can measure birefringence of anisotropic materials.  With its hot plate option, it can characterize the index of refraction and thermal expansion of a film as a function of temperature.  And its spectroscopic ellipsometer option allows measurement of very thin films.  A prime application for this system is measuring the index of refraction and thickness of planar waveguide films.

•  FilmTek™ 4000EM-DUV is our most advanced thin-film metrology system.  It leverages the combination of new proprietary Multi-Angle Differential Polarimetry technology with SCI’s patented Differential Power Spectral Density technology to provide an optical thin-film metrology tool with the best resolution, accuracy, and repeatability in the industry.  The FilmTek™ 4000EM-DUV utilizes spectroscopic reflection (190nm-1700nm) of polarized light at multiple angles to independently measure film thickness and index of refraction.  By independently measuring index and thickness, the FilmTek™ 4000EM-DUV is far more sensitive to changes in films, particularly films within multi-layer stacks, than existing metrology tools that rely on conventional ellipsometry or reflectometry techniques.  Additionally, the FilmTek™ 4000EM-DUV has a small measurement spot size to allow for measurement directly on product wafers (measures within a 50x50 micron feature).

Reflectance and Power Spectral Density Analysis

Analysis of polyimide film coating a thermal oxide film grown on a silicon wafer.

Power Spectral Density analysis of polyimide and oxide films.

FilmTek^TM 4000 High Precision Measurement of Index

This unique FilmTek™ 4000 capability employ’s our patented DPSD (Differential Power Spectral Density) technique.  Spectroscopic reflection data are gathered at normal incidence and 70 degrees.  PSD processing results in two peaks in the Power Spectral Density domain.  The ratio of their positions is a function of the index of refraction of the film, and the angle of incidence of the oblique measurement.  This ratio is used to calculate the index.  Once the index is known, the thickness can be calculated from the optical thickness of the normal incident peak.

 SiO₂ Film Properties vs Temperature

With the hot plate option, the FilmTek™ 4000 can characterize the index of refraction and thermal expansion of a film as a function of temperature.

Measured by FilmTek™ 4000 with heating chuck during one heat-cool cycle.

FilmTek^TM Surface Roughness Measurement

Fast, dependable, and non-contact, FilmTek™ measures surface roughness and damage with excellent correlation to other measurement techniques such as atomic force microscopy (AFM).

FilmTek™ 2000 vs AFM surface roughness measurement.

SCI Dispersion Model

Our dispersion model is derived from quantum mechanical principles and correctly obeys the Kramer-Kronig relationship.  It is applicable to metallic, semiconductor, amorphous, crystalline, and dielectric materials.  A broad array of single layer and multilayer films have been successfully analyzed, including:

 Substrate examples include:

By employing a dispersion model covering the entire wavelength range of the measurement, the number of variables or parameters required to model optical response is reduced, eliminating the potential for multiple solutions.

FilmTek™ Configurations

We offer a variety of configurations and options to fit every need from R&D to high volume manufacturing in controlled environments.

They include:

• Standard probe head (<1 mm spot size)

• Microscope based (down to 5 µm spot size)

• Reflection mode measurements

• Transmission mode measurements

• Spectroscopic ellipsometry measurements

• Automated stage

• Cassette to cassette robotic transfer

• SMIF box

• Pattern recognition

• Heating chuck

• In-situ; for integration with process equipment

• Windows based operating system

• Menu-driven, user friendly software

SCI's products are offered in three categories; stand-alone FilmTek™ film metrology systems, film design and analysis software, and Integrated Metrology Modules. The latter is only offered to OEM companies on a project by project basis.

FilmTek™ Systems

FilmTek™ systems are offered in a variety of configurations and capabilities in order to match every film measurement need and budget.  These systems are computer controlled and offer full automation through simple to use recipe-based control software.  The measurements are non-contact, and most can take place in as little as one second.  The following table summarizes some of the features of the standard models.  The large array of available options make it possible to tailor a FilmTek™ system according to the exact customer requirements.

Measurement Features	FilmTek™ 1000	FilmTek™ 1500	FilmTek™ 2000	FilmTek™ 3000	FilmTek™ 2000SE	FilmTek™ 4000
Index of Refraction (at 2µm thickness)	±0.005	±0.005	±0.002	±0.002	±0.0002	±0.00002
Thickness Measurement Range	10nm-150mm	10nm-150mm	5nm-150mm	5nm-150mm	1Å-150mm	3nm-350mm
Maximum Spectral Range	380-1000nm	380-1000nm	190-1700nm	190-1700nm	190-1700nm	190-1700nm
Standard Spectral Range	380-1000nm	380-1000nm	240-860nm	240-860nm	240-1000nm	380-1000nm
Reflection
Transmission
Optional Spectroscopic Ellipsometry
Power Spectral Density
Multi-angle Measurements (DPSD)
Both TE & TM Components of Index
Multi-layer thickness
Index of Refraction
Extinction (absorption) Coefficient
Energy band gap
Composition
Crystallinity
Inhomogeneous Layers
Surface Roughness
A variety of options can extend these standard measurement capabilities.