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FilmTek™ 1000, FilmTek™ 1000M, and FilmTek™ 1500

Reflection and Transmission Spectrophotometry

Based on reflection spectrophotometry from the visible to NIR, FilmTek™ 1000 is an accurate and economical film thickness measurement system.  FilmTek™ 1000 combines a fiber-optic spectrophotometer with revolutionary material modeling software to provide an affordable and reliable tool for the simultaneous measurement of film thickness, refractive index, and extinction coefficient.  The FilmTek™ 1000M has a small spot size and comes equipped with a manual or automatic XY stage to accommodate 75-200mm wafer sizes.  The FilmTek™ 1500 measures both transmission and reflection at normal incidence and is ideal for transparent substrates.

FilmTek™ 1000 Features

	Versatile: FilmTek™ 1000 incorporates SCI’s generalized material model with advanced global optimization algorithms for simultaneous determination of:     - Multiple layer thicknesses   - Indices of refraction [ n(l ) ]   - Extinction (absorption) coefficients [ k(l ) ]
	Low Cost: The cost of ownership of a FilmTek™ 1000 is a small fraction of comparable instruments.
	No Special Knowledge Required: FilmTek™ 1000 software is designed so that minimal experience in personal computers, thin film optical design, or measurement techniques is required.
	Non-contact and non-destructive.

Applications

Virtually all translucent films ranging in thickness from 100 angstroms to approximately 150 microns can be measured with high precision.  Typical applications include:

	Semiconductor and dielectric materials			Computer disks
	Multilayer optical coatings			Coated glass
	Optical antireflection coatings			Laser mirrors
	Electro-optical materials			Thin metals

Example Films
	SiOx			a-Si
	SiNx			a-C:H
	DLC			ITO
	SOG			Polysilicon
	Photoresist			Polyimide
	Thin metals			Low k dielectric films

Example Substrates
	Silicon			GaAs
	SOI			Glass
	SOS			Aluminum

Hardware

FilmTek™ 1000 includes:

	VIS/NIR spectrophotometer
	VIS/NIR light source
	Fiber optic cables
	Fixed stage with optics
	Computer with multi-core processor running Windows™ XP Operating System

FilmTek™ 1000 / 1000M / 1500 Technical Specifications
Film thickness range:	10nm-350µm (10nm-150µm standard)
Film thickness accuracy:	±2Å for NIST traceable standard oxide 1000Å to 1µm
Spectral range:	380nm-950nm
FilmTek™ 1000/1500 measurement spot size:	2mm to 5mm (5mm standard)
FilmTek™ 1000M measurement spot size:	60µm (4x objective) or 24mm (10x objective)
Sample size:	2mm to 300mm standard
Spectral resolution:	0.2nm
Light source:	Regulated tungsten-halogen lamp (10,000 hrs lifetime)
Detector type:	3648 pixel Toshiba linear CCD array
Reflection and transmission static repeatability @ 600nm (1s):	0.01%
Measurement time:	<1 sec per site (e.g., oxide film)
Data acquisition time:	0.2 sec
Computer:	Multi-core processor with Windows™ XP Operating System

 

Film(s)	Thickness	Measured Parameters	Precision (1σ)
Oxide / Si	200-500 Å	t	0.5 Å
	500-10,000 Å	t	0.25 Å
	1000 Å	t, n	0.25 Å / 0.001
Nitride / Si	200-10,000 Å	t	0.25 Å
Photoresist / Si	200-10,000 Å	t	0.5 Å
a-Si / Oxide / Si	20-10,000 Å	t	0.5 Å

 

 

Methodology

FilmTek™ simultaneously solves for refractive index n(l ), extinction coefficient k(l), and thicknesses of multi-layer film structures.  A self-consistent solution is obtained by using SCI’s generalized dispersion formula to model fitted values of the dielectric function e (l).  The SCI dispersion formula is quite general and applies to metallic, amorphous, crystalline, and dielectric materials (Figures 1-3).  This approach allows the user to model complex multi-layer structures with reflection/transmission data.  Global optimization methods are used to obtain the best solution while avoiding local minima and minimizing sensitivity to the user’s initial guess of fitted parameters (i.e., layer thickness).  FilmTek™ optimizes both the reflectance and power density spectrum (FFT) simultaneously.  This unique feature allows for accurate thickness determination over a wide range of thickness (10nm to 350µm).

Fig. 1 n and k spectra of Silicon

Fig. 2 n and k spectra of SiO2

Fig. 3 n and k spectra of Tantalum

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