Home | Customer Support | Download Center | Literature | Search

Applications

FilmTek™ metrology systems can measure a broad array of single and multi-layer films including metallic, semiconductor, amorphous, crystalline, and dielectric materials on virtually any substrate.  FilmTek™ can simultaneously determine:

• Multiple layer thicknesses (from <1Å to 250 microns)
• Indices of refraction [ n(l) ]  (both TE and TM components of index)
• Extinction (absorption) coefficients [ k(l) ]
• Birefringence (l)
• Energy band gap [ E_g ]
• Surface roughness and damage

• Porosity, composition, and crystallinity (EMA model)

• Film properties versus temperature
• Wafer curvature and film stress

Optoelectronics Application Reports

• Characterizing Oxide Films for Waveguide Applications
• FilmTek™ 4000 Repeatability
• Characterizing Film Properties versus Temperature
• Measuring Color Coordinates: Colored Resists
• Characterizing OLED Display Materials
• Characterizing Birefringent Materials: PET

Semiconductor Application Reports

• Measuring Surface Roughness
• Characterizing Very Thin ONO Films
• Characterizing Advanced Low-k Materials
• Characterizing High-k Materials
• Characterizing SiGe
• Measuring Silicon on Insulator (SOI) Films
• Characterizing Amorphous Silicon and Polysilicon
• Characterizing Silicon on Sapphire (SOS)
• Characterizing Phase Change Materials: GeSbTe (GST)
• Characterizing Photomasks

Copyright© Scientific Computing International 1993-2008. All rights reserved.

Top